JPH0319987Y2 - - Google Patents
Info
- Publication number
- JPH0319987Y2 JPH0319987Y2 JP1985155952U JP15595285U JPH0319987Y2 JP H0319987 Y2 JPH0319987 Y2 JP H0319987Y2 JP 1985155952 U JP1985155952 U JP 1985155952U JP 15595285 U JP15595285 U JP 15595285U JP H0319987 Y2 JPH0319987 Y2 JP H0319987Y2
- Authority
- JP
- Japan
- Prior art keywords
- steam
- cleaning
- cleaned
- cylindrical body
- inlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985155952U JPH0319987Y2 (en]) | 1985-10-12 | 1985-10-12 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985155952U JPH0319987Y2 (en]) | 1985-10-12 | 1985-10-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6272184U JPS6272184U (en]) | 1987-05-08 |
JPH0319987Y2 true JPH0319987Y2 (en]) | 1991-04-26 |
Family
ID=31077115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985155952U Expired JPH0319987Y2 (en]) | 1985-10-12 | 1985-10-12 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0319987Y2 (en]) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5758476U (en]) * | 1980-09-25 | 1982-04-06 | ||
JPS6020937A (ja) * | 1983-07-13 | 1985-02-02 | Asahi Chem Ind Co Ltd | 溶剤蒸気による表面処理方法及びその装置 |
-
1985
- 1985-10-12 JP JP1985155952U patent/JPH0319987Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS6272184U (en]) | 1987-05-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3786549B2 (ja) | 半導体湿式エッチング装置 | |
US5921257A (en) | Device for treating substrates in a fluid container | |
EP1039506B1 (en) | Apparatus for cleaning and drying substrates | |
EP0420958A1 (en) | HF GAS STRIPPING OF WAFERS IN AN ACID PROCESSOR. | |
KR100361331B1 (ko) | 건조장치 | |
US5499642A (en) | Washing apparatus | |
JPH0319987Y2 (en]) | ||
JPH0319988Y2 (en]) | ||
JPH0340398Y2 (en]) | ||
KR20190035249A (ko) | 액상 연마제 교반장치 및 교반장치의 청소방법 | |
CN103831264B (zh) | 全自动清洗机 | |
JPH08144169A (ja) | 竪型パッケージ染色処理装置 | |
JPS6034396Y2 (ja) | 洗浄装置 | |
JP3243875U (ja) | クイックコネクタ洗浄機 | |
JPS57160130A (en) | Wafer washing and drying apparatus | |
JPS6045922B2 (ja) | 洗浄蒸気の凝縮方法およびその装置 | |
KR20010110696A (ko) | 웨이퍼 처리 장치 | |
KR200181400Y1 (ko) | 습식 반도체 식각 세정 헹굼장치 | |
JPH06269603A (ja) | 真空蒸留装置 | |
JPS5938383Y2 (ja) | 洗壜機の浸壜槽放熱防止構造 | |
JP4722974B2 (ja) | フープ洗浄乾燥装置 | |
JPS6221349Y2 (en]) | ||
JPS63197590A (ja) | 洗浄装置 | |
JPS6311175Y2 (en]) | ||
JPH11319470A (ja) | 排ガス処理装置 |